Nanoimprint Lithography

Nanoimprint Lithography (NIL) is a high-resolution, cost-effective technique for patterning nanoscale features on substrates. Unlike traditional photolithography, which uses light to define patterns, NIL physically imprints a template into a resist layer, enabling extremely fine features with sub-10 nm resolution. NIL is widely used in semiconductor, MEMS, photonics, and nanotechnology applications where precise, repeatable nanoscale patterning is critical.