EVG®770
The EVG770 is designed for step-and-repeat nanoimprint lithography, being utilised for direct patterning of complex structures on substrates, as well as efficient master fabrication. Uniform replication of templates is enabled – from small dies up to 50 mm x 50 mm across large areas up to 300 mm substrate sizes. Step-and-repeat imprinting is typically used in combination with direct writing methods and diamond turning to produce masters which are needed in wafer-level optics manufacturing or the EVG SmartNIL process. Among the EVG770’s key features are; full process control, exact alignment capabilities, and the adaptability to meet requirements for a broad range of devices and applications.
Features:
- Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL®
- Simple implementation of different kind of masters
- Variable resist dispense modes
- Live image during dispensing, imprinting and demolding In-situ force control for imprint and demolding
- Optional optical wedge error compensation
- Optional automated cassette-to-cassette handling
Applications:
- Wafer-Level Optics (WLO): Fabrication of microlenses and other optical components for advanced imaging systems.
- Augmented Reality (AR) Waveguides: Production of waveguides for AR devices, enabling advanced display technologies.
- Diffractive Optics: Manufacturing of diffractive optical elements for various photonic applications.
- Metasurfaces: Creation of nanostructured surfaces with tailored optical properties.
- Biomedical Devices: Development of microfluidic devices and lab-on-a-chip systems for medical diagnostics and research.