EVG®7200

The EVG®7200 system utilises EVG’s advanced SmartNIL™ technology, enabling the fabrication of micro- and nanostructures with exceptional pattern fidelity and low residual layer. Exposure is driven by tunable LED lamps, allowing for the rapid solidification of a wide range of UV-curable materials, thereby improving throughput. The system ensures high yield through controlled and smooth demolding, with integrated force measurement for precision. Ideal for large-area nanostructure printing, the EVG®7200 delivers unmatched throughput, low cost of ownership, and is perfectly suited for the volume production of next-generation microfluidic and photonic devices, such as diffractive optical elements (DOEs). With its combination of high performance and cost efficiency, the EVG®7200 with SmartNIL™ technology is the optimal solution for advanced nanotechnology applications. (*Resolution is dependent on process and template.)

Features:

• Volume-proven imprinting technology with superior replication fidelity
• Proprietary SmartNIL® technology with multiple-use polymer stamp technology
• Integrated imprinting, UV curing, demolding, and working stamp fabrication
• Automated cassette-to-cassette handling plus semi-automated R&D mode
• Optional top-side alignment
• Optional mini-environment
• Open platform for all commercially available imprint materials
• Scalability from R&D to production
• System housing for best process stability and reliability

Applications:

• Display Technologies
  Fabrication of wire grid polarizers and other optical components for displays.
  
  
• Photonic Devices
  Production of diffractive optical elements (DOEs) and other photonic structures.
  
  
• Biotechnology
  Development of microfluidic devices and lab-on-a-chip systems.
  
  
• Optical Components
  Manufacturing of micro-optical lenses and gratings.