Ion Beam Technology

Ion beam technology uses a focused stream of ions (charged particles) to etch, mill or deposit material on a substrate with nanometre-scale precision. Because the ion beam is directional and tightly controllable, it enables processes that conventional wet or plasma-based methods can't match, particularly where high-aspect-ratio features or fine uniformity control are required.

IES supplies, installs, relocates and supports ion beam systems for semiconductor, MEMS, optics, photonics and thin-film research applications, including the scia Systems Mill and Coat product ranges.