Ion Beam Technology

Ion Beam Technology uses a focused stream of ions (charged particles) to modify, etch, or deposit materials on a substrate with extremely high precision. This approach is widely used in semiconductor manufacturing, MEMS, optics, photonics, and thin-film research because it enables: Nanometre-scale patterning, High-aspect-ratio etching, Precise material deposition. Unlike conventional etching or deposition methods, ion beam processes are directional and can be controlled with remarkable accuracy, making them ideal for applications requiring uniformity and fine feature control across a substrate.