scia Coat 200
The scia Coat 200 delivers exceptional uniformity for coatings on substrates up to 200 mm. Utilizing ion beam sputter deposition, it ensures the creation of smooth, defect-free films, surpassing traditional deposition processes. In-situ optical monitoring guarantees superior process stability. The system also supports the handling of both wafers and arbitrary-shaped substrates, making it versatile for a wide range of applications.
Key features:
- Excellent uniformity by substrate rotation and tilt
- Up to 5 water-cooled target materials on a rotational holder for in-situ change
- Recipe-controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM) and test glass changer
- Direct wafer handling or adaptation to variable substrate sizes with carrier handling
- Equipped with a 350 mm ion beam source as assist source, also usable for ion beam etching processes
Applications
- Precision optics / photonics
For example, optical high- and anti-reflective coatings, bandpass and notch filters, multilayer mirror stacks. - Magnetic sensors / spintronics
Multilayer films for GMR (Giant Magneto-Resistive), TMR (Tunnel Magneto-Resistive) sensors, and related devices. - Microelectronics / MEMS / semiconductor research
The tool is also used for dielectrics and metal layers deposition in research & production of advanced devices. For example, the system’s purchase by NIST for microfabrication. - Advanced coatings / functional films
Additional use-cases include deposition of metal oxides (transparent, conductive, resistive) with precise stoichiometry, for example via dual ion beam sputtering (DIBS).