scia Coat 500

The scia Coat 500 is designed for the homogeneous coating of large substrates, ideal for precision optics. With recipe-controlled deposition processes, it ensures repeatable quality for multilayer stacks. A customisable shaper system (up to 4 shapers) compensates for material- or parameter-dependent inhomogeneity effects, enabling the deposition of precisely defined gradient films.

Key features:

• Excellent uniformity due to linear movement
• Up to 6 water-cooled target materials on a rotational holder for in-situ change
• Recipe controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM)
• Controlled movement of linear axis system for gradient coating or surface error correction
• Optional substrate heating up to 250 °C to optimize film stress

Technical Data:

• Substrate size - (up to) 500 mm x 300 mm, 300 mm dia. for rotation
• Substrate holder - Linear movement from 0.1 mm/min up to 900 mm/min, 
  rotation up to 300 rpm
  Ion beam sources Two 380 mm linear microwave ECR sources (LIN380-e)
• Neutralizer - Filament driven plasma bridge neutralizer (N-DC)
• Target holder - Target drum with up to 6 tiltable and water-cooled 
  targets (each max. 400 mm x 200 mm)
• Typical deposition rate - Si: 10 nm/min
• Uniformity variation - ≤ 0.5 % over 200 mm dia. (σ/mean)
  ≤ 2.0 % over 500 mm x 300 mm (σ/mean)
• Base pressure - < 5 x 10-8 mbar
• System dimension:
  (W x D x H)
  3.30 m x 2.40 m x 2.10 m
  (without electrical rack and pumps)
• Configurations - Single chamber, optional single substrate load lock for 
  substrates up to 200 mm dia.
• Software interfaces - SECS II / GEM, OPC

Applications 

• Precision optics & photonics: The Coat 500 is designed for large-substrate and large-area coating, especially optical mirrors and high-precision optics.
  
  
• X-ray / synchrotron optics: Multilayer coatings (e.g., Bragg mirror stacks) for X-ray mirrors, synchrotron beamlines, and other analytical optics. 
  
  
• Large-area optical filters & bandpass mirrors: For large substrates (up to ~500 mm × 300 mm) used in optics, lasers, and maybe display or sensor systems. 
  
  
• High‐value multilayer thin film manufacturing: Where defect-free, dense, smooth films are required — e.g., dielectric/metal stacks for specialized coatings.