Plasma Etch

Plasma Etching is a precise material removal technique widely used in semiconductor, MEMS, photonics, and advanced materials fabrication. By generating a plasma—an ionised gas composed of reactive species—materials can be selectively etched from a substrate with high accuracy and anisotropy. Plasma etching is critical for defining micro- and nanoscale features, creating trenches, vias, and patterns in thin films, and preparing surfaces for subsequent processing steps. Its also typically used in applications such as: optics, Thin films & coatings and Nanotechnology.