Atomic Layer Deposition

Atomic Layer Deposition (ALD) is a thin-film coating process that builds materials up one atomic layer at a time, using alternating pulses of precursor gas that react with a surface in a controlled, self-limiting way. Because each reaction stops itself once the surface is saturated, ALD produces coatings with exceptional uniformity, precise thickness control, and full conformity — even over complex 3D or high-aspect-ratio structures where other deposition methods struggle.

IES supplies, installs, relocates and supports ALD systems for semiconductor, microelectronics and advanced materials manufacturers, including the Savannah, Fiji, Firebird and Phoenix platforms.