Savannah

<h2>Advanced Capabilities for Advanced Research</h2>

Veeco’s Savannah® Series is a trusted platform for atomic layer deposition (ALD), combining precision with accessibility for both academic and industrial environments. Built with ease of use and operational efficiency in mind, it offers a reliable entry point for those seeking robust thin film deposition without compromise. With hundreds of systems deployed globally, Savannah® has become the preferred choice for university research teams working in ALD. Its intelligent design ensures efficient precursor use and energy savings, helping reduce overall operating costs while maintaining process consistency at the atomic scale.

<h3>Key features include:</h3>
<ul>
<li>In-Situ Ellipsometry</li>
<li>In-Situ QCM</li>
<li>Self Assembling Monolayers</li>
<li>2-Second Cycle Times</li>
<li>Integrated Ozone</li>
<li>Low Vapor Pressure Deposition</li>
<li>Batch Processing</li>
<li>Glove Box Integration</li>
</ul>
<p>Savannah® is equipped with high-speed pneumatic pulse valves to enable our unique Exposure Mode™ for thin film deposition on Ultra High Aspect Ratio substrates. This proven precision thin film coating methodology can be used to deposit conformal, uniform films on substrates with aspect ratios of greater than &gt; 2000:1. Savannah® is available in three configurations: S100, S200, and S300. Savannah® is capable of holding substrates of different sizes (up to 300mm for the S300). The Savannah® thin film deposition systems are equipped with heated precursors lines and the option to add up to six lines. Savannah® is capable of handling gas, liquid, or solid precursors.</p>
<h3>Savannah® G2 Technical specifications</h3>
<table id="productTable" style="border-color: #99acc2; border-collapse: collapse; table-layout: fixed; margin-left: auto; margin-right: auto;" cellpadding="4" border="1">
<tbody>
<tr>
<td><strong>Substrate Size</strong></td>
<td>Savannah S100: up to 100 mm<br>Savannah® S200: up to 200 mm<br>Savannah® S300: up to 300 mm</td>
</tr>
<tr>
<td><strong>Dimensions (w x d x h)</strong></td>
<td>Savannah S100: 585 x 560 x 980 mm<br>Savannah® S200: 585 x 560 x 980 mm<br>Savannah® S300: 686 x 560 x 980 mm</td>
</tr>
<tr>
<td><strong>Cabinet</strong></td>
<td>Steel with white powder coat paint with removable panels and lockable precursor door</td>
</tr>
<tr>
<td><strong>Operational Modes</strong></td>
<td>Continuous Mode™ (high speed) or Exposure Mode™ (ultra-high aspect ratio)</td>
</tr>
<tr>
<td><strong>Power</strong></td>
<td>115 VAC or 220 VAC,1500 W (excluding pump)</td>
</tr>
<tr>
<td><strong>Controls</strong></td>
<td>LabVIEW™, Windows™ 7, Lenovo Laptop, USB control</td>
</tr>
<tr>
<td><strong>Maximum Substrate Temperature</strong></td>
<td>S100: RT – 400 °C<br>S200: RT – 350 °C<br>S300: RT – 350 °C</td>
</tr>
<tr>
<td><strong>Deposition Uniformity</strong></td>
<td>(Al₂O₃) &lt;1% (1σ)</td>
</tr>
<tr>
<td><strong>Cycle Time</strong></td>
<td>&lt;2 seconds per cycle with Al₂O₃&nbsp;at 200 °C</td>
</tr>
<tr>
<td><strong>Vacuum Pump</strong></td>
<td>Alcatel 2021C2 – 14.6 CFM</td>
</tr>
<tr>
<td><strong>Compatibility</strong></td>
<td>Clean room class 100 compatible</td>
</tr>
<tr>
<td><strong>Compliance</strong></td>
<td>CE, TUV, FCC</td>
</tr>
<tr>
<td><strong>Precursor Delivery System, Ports</strong></td>
<td>2 lines standard, up to 6 lines available<br>Each line accommodates solid, liquid and gas precursors<br>Lines can be independently heated up to 200 °C</td>
</tr>
<tr>
<td><strong>Precursor Delivery System, Valves</strong></td>
<td>Industry standard high speed ALD valves with 10 msec response time</td>
</tr>
<tr>
<td><strong>Precursor Cylinders</strong></td>
<td>Individually heated 50 ml stainless steel cylinders, optional larger cylinders available</td>
</tr>
<tr>
<td><strong>Carrier/Venting Gas</strong></td>
<td>N₂&nbsp;mass flow controlled, 100 SCCM</td>
</tr>
<tr>
<td><strong>Options</strong></td>
<td>Low Vapor Pressure Delivery (LVPD) System<br>Ozone Generator<br>Dome lid for wafer cassette or 3D objects<br>Glove box Interface<br>In-Situ Ellipsometry<br>In-Situ Quartz Crystal MicroBalance (QCM)<br>Self Assembling Monolayers (SAMs)<br>Particle Coating</td>
</tr>
</tbody>
</table>

Applications

• Materials research / advanced R&D Researchers working on new thin-film materials, 2D materials, novel oxides, nitrides, sulfides etc. The flexibility (gas/liquid/solid precursors) makes it ideal for exploring new chemistries. High-aspect ratio substrate research (e.g., porous structures, nanowires, 3D microstructures) because of the Exposure Mode supporting ultra-high aspect ratios. University clean-rooms, nanofab labs using up to 200 mm or 300 mm wafers for prototype work. For example, one institution lists a Savannah S200 system up to 200 mm substrates. 
  
  
• Semiconductor / electronics (R&D stage) Because ALD enables ultra-thin, uniform films across complex structures, the system is appropriate for R&D of dielectric films, barrier films, seed films etc. in advanced semiconductor device development. The conformality and uniformity at atomic layer scale is critical as device geometries shrink and move into 3D. (General ALD context). For example, deposition of Al₂O₃, HfO₂ utilising the Savannah platform during experiments. 
  
  
• MEMS, sensors, micro-devices Micro-electro-mechanical systems (MEMS), micro-sensors often have complex 3D geometry (trenches, holes, high aspect ratio features) that benefit from ALD’s conformality; the Savannah’s high aspect ratio capability makes it suitable.Thin film coatings for sensors (gas sensors, biosensors) or protective/coating layers for microstructures could be developed using Savannah.
  
  
• Optics / Photonics / Advanced packaging research Thin films for optical coatings (anti-reflection, waveguides, photonic devices) where uniformity and control at the nanoscale matter.Research in advanced packaging, e.g., conformal coatings on non-standard substrates, 3D structures, which the Savannah supports.
  
  
• Barrier / encapsulation coatings in prototyping Because ALD can deliver pinhole-free, ultra-thin coatings used for barrier or encapsulation (e.g., for flexible electronics, micro-devices), the Savannah is appropriate for R&D of such protective films. For example, one centre uses Savannah for oxide/nitride deposition for hermetic encapsulation of implantable devices. 

• Emerging materials / thin-film application domains Given the flexibility of the tool to handle solid, liquid or gas precursors and support novel chemistries, industries such as battery research, catalysis, wearable electronics, flexible substrates may use Savannah for prototyping/development of conformal coatings, thin films for energy applications (though more in R&D than production). The general ALD market overview mentions Veeco’s tools applied in energy, biomedical, micro-electromechanical systems etc.