Chemical Vapour Deposition

Chemical Vapour Deposition (CVD) is a widely used technique for depositing high-quality thin films onto substrates in semiconductor, MEMS, photonics, and advanced materials industries. In CVD, gaseous precursors react or decompose on a substrate surface to form a solid film, while by-products are removed as gas. CVD enables precise control over film composition, thickness, uniformity, and conformality, making it essential for high-performance devices. It is used to deposit metals, oxides, nitrides, and other functional coatings. Typical applications include: Semiconductors – Gate oxides, dielectric layers, passivation coatings, and barrier layers, MEMS devices, Photonics & optics, Solar & energy devices and Advanced materials.