Q150

The Q 150 is a compact, high-performance plasma system designed for semiconductor and microelectronics applications. Featuring a quartz glass process chamber and microwave plasma generation, it delivers precise, low-damage surface treatment for substrates up to 125 mm in diameter. Ideal for cleanroom environments, it offers both tabletop and wall-mounted installation options to suit diverse laboratory setups.

Key Features:

• Process Chamber: Quartz glass, 150 mm diameter, 260 mm depth, providing a 6-liter volume for efficient plasma processing.
• Microwave Power: Operates at 2.45 GHz with adjustable power output ranging from 50 to 1,200 W, enabling flexible control over plasma density and energy.7
• Vacuum System: Equipped with a Pirani gauge (1–1,000 Pa), DN 25 ISO-K vacuum connection, and an electro-pneumatic valve for precise pressure control.
• Utilities: Requires a 3-phase AC 50/60 Hz 400/240 V 16 A power supply.
• Dimensions: 500 mm (W) × 370 mm (D) × 550 mm (H); weighs 40 kg (excluding pump).
• Installation Options: Suitable for cleanroom wall installation or as a tabletop unit, offering flexibility to fit various laboratory configurations.

Applications

• Semiconductor manufacturing (lithography, resist stripping, cleaning steps)
  
  
• MEMS / microelectromechanical systems fabrication
  
  
• Chip packaging and advanced packaging (wire-bond, flip-chip, underfill, RDL)
  
  
• Photonics and optoelectronic device manufacture (where surfaces need cleaning/activation)
  
  
• R&D / pilot production labs with smaller wafers or non-standard substrates