Q150

What is the Q150?

The Q 150 is a compact, high-performance plasma system designed for semiconductor and microelectronics applications. Featuring a quartz glass process chamber and microwave plasma generation, it delivers precise, low-damage surface treatment for substrates up to 125 mm in diameter. IES represents Alpha Plasma in the UK, Benelux, Ireland, and Scandinavia, supplying, installing, and supporting the Q150 for customers across these regions.

What are its key technical specifications?

The process chamber is quartz glass, 150 mm diameter and 260 mm deep, providing a 6-litre volume for efficient plasma processing. Microwave power operates at 2.45 GHz with adjustable output ranging from 50 to 1,200 W, enabling flexible control over plasma density and energy. The vacuum system is equipped with a Pirani gauge (1–1,000 Pa), a DN 25 ISO-K vacuum connection, and an electro-pneumatic valve for precise pressure control.

Where can it be installed?

Ideal for cleanroom environments, the Q150 offers both tabletop and wall-mounted installation options to suit diverse laboratory setups.

What is it typically used for?

Typical applications include removal of photoresist after high-dose implantation, surface preparation before or after wet or dry etching, processing of SU-8 and other epoxy-based resists, and creation of sacrificial layers in MEMS fabrication.

Where can I buy or get support for the Q150 in the UK?

As Alpha Plasma's representative in the UK, Benelux, Ireland, and Scandinavia, IES provides sales, installation, and engineering support for the Q150 and the wider Alpha Plasma equipment portfolio.

Key Features:

• Process Chamber: Quartz glass, 150 mm diameter, 260 mm depth, providing a 6-liter volume for efficient plasma processing.
• Microwave Power: Operates at 2.45 GHz with adjustable power output ranging from 50 to 1,200 W, enabling flexible control over plasma density and energy.7
• Vacuum System: Equipped with a Pirani gauge (1–1,000 Pa), DN 25 ISO-K vacuum connection, and an electro-pneumatic valve for precise pressure control.
• Utilities: Requires a 3-phase AC 50/60 Hz 400/240 V 16 A power supply.
• Dimensions: 500 mm (W) × 370 mm (D) × 550 mm (H); weighs 40 kg (excluding pump).
• Installation Options: Suitable for cleanroom wall installation or as a tabletop unit, offering flexibility to fit various laboratory configurations.

Applications

• Semiconductor manufacturing (lithography, resist stripping, cleaning steps)
  
  
• MEMS / microelectromechanical systems fabrication
  
  
• Chip packaging and advanced packaging (wire-bond, flip-chip, underfill, RDL)
  
  
• Photonics and optoelectronic device manufacture (where surfaces need cleaning/activation)
  
  
• R&D / pilot production labs with smaller wafers or non-standard substrates