EVG®6200 NT

The EVG®6200 NT delivers high-performance mask alignment with a compact footprint, designed for environments demanding both flexibility and throughput. Available in semi-automated and fully automated configurations—including the fully enclosed Gen2 version—the system is built to meet the rigorous standards of high-volume manufacturing. Featuring integrated vibration isolation, advanced alignment accuracy, and support for EVG’s proprietary SmartNIL™ technology, the EVG®6200 NT excels in a wide range of applications. These include exposure of thin and thick resists, deep cavity patterning, and processing of delicate materials such as compound semiconductors. Designed with ease of use in mind, the system offers quick mask and tooling changes, intuitive software, and a robust global support network—making it a reliable solution for demanding production and research environments alike.

Features

• Wafer/substrate size from pieces up to 200 mm/8’’
• System design supporting versatility of lithography processes
• Throughput up to 180 WPH in first print mode or up to 140 WPH in automatic alignment mode
• Fragile, thin or warped wafer handling of multiple wafer sizes with quick change-over time
• Automated contact-free wedge compensation sequence with proximity spacers Auto origin function for precise centering of alignment key
• Dynamic alignment function featuring real-time offset correction
• Supports the latest UV-LED technology
• Rework sorting wafer management and flexible cassette system
• Manual substrate loading capability on automated system
• Field upgradeable from semi-automated to fully automated version
• Minimized system footprint and facility requirements
• Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
• Advanced Software features and compatibility between R&D and full-scale production
• Agile processing and conversion re-tooling
• Remote tech support & SECS/GEM compatibility
• Table top or stand-alone version with anti-vibration granite table
• Additional capabilities:
• Bond alignment
• IR alignment
• Nanoimprint lithography (NIL)

Applications

• Mask-based photolithography (optical lithography)
  Standard patterning of photoresist via mask exposure, with alignment, for microfabrication/metrology.
  
  
• Double-sided / back-side lithography
  Because it supports bottom-side and IR alignment, it’s well suited for processes where features are needed on both sides of a wafer (e.g. through‑wafer vias, MEMS membranes, backside contacts).
  
  
• Nanoimprint lithography (NIL / SmartNIL®)
  Using imprint (stamp) techniques to replicate nanoscale patterns, especially where high resolution and fidelity are needed.
  
  
• Wafer/substrate bonding & alignment
  Bond alignment (aligning two wafers or substrates before bonding) is supported; useful for stacked device architectures, 3D integration, heterogeneous integration.
  
  
• Patterning challenging topographies / non-ideal substrates
  Because the 6200 NT supports fragile, warped, bowed substrates, it can handle patterning on less-than-perfect surfaces (e.g. non‑flat materials, nonstandard wafers).
  
  
• High-throughput R&D / pilot production        
  The throughput, automation, and industrial features make it suitable not just for lab-scale work, but transitional environments (pilot lines) or small-volume production.
  
  
• Process transfer / bridging to production
  Because its modes, automation, and handling features mirror those required for manufacturing, processes validated on the 6200 NT can be more easily transferred to full-scale production tools.
  
  
• Advanced devices: MEMS, photonics, sensors, power devices       
  In domains requiring precise overlay, alignment, multi-layer stacking, or imprint-based nanoscale features, the 6200 NT can serve as both development and limited-run fabrication tool.
  
  
• Metrology, overlay verification, alignment studies        
  Its alignment accuracy and dynamic alignment features make it useful in process development / research for validating alignment fidelity, overlay errors, or alignment strategies.