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A Complex Intercontinental Move and Assembly Project for Multiple Ion Implanters

At IES, we love a challenge. In fact, the more complex the project is, the better.

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Ion Implanter in a Fab

The Subtle Art of Relocating Complex, One-of-a-Kind Equipment Across Borders

Few complex engineering projects compare to the challenge of relocating sensitive, high-technology equipment across borders.

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Trusted Partners for the Microelectronics Industry

At IES, we partner with leading global manufacturers to provide an extensive portfolio of advanced technologies supporting research, development, and production across the semiconductor and compound materials industries.

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Move complex, business-critical equipment

Whether you’re moving a single piece of equipment or an entire production line, our trusted team of engineers can support every step of your move, from rigging to end-to-end relocation support across the globe.

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EVG®510

The EVG®510 is a highly flexible wafer bonding system, supporting a wide range of processes including anodic, glass frit, solder, eutectic, transient liquid phase, and direct bonding. Its easy-access bond chamber and intuitive tooling design facilitate quick retooling for different wafer sizes and processes, making it an excellent choice for universities, R&D facilities, and low-volume production applications. The bond chamber design closely mirrors that of EVG’s high-volume manufacturing tools, such as the EVG® GEMINI, ensuring compatibility and enabling easy transfer of bonding recipes. This makes the EVG®510 an ideal platform for scaling up production volumes as needs evolve.

Features:

  • Unique pressure and temperature uniformity
  • Compatible with EVG mechanical and optical aligners
  • Flexible design and configurations for research and piloting
  • Form single chips to wafers
  • Various processes (eutectic, solder, TLP, direct bonding)
  • Optional turbopump (<1E-5 mbar)
  • Upgradeable for anodic bonding
  • Open chamber design for easy conversion and maintenance
  • Production compatible
  • High throughput with fast heating and pumping specifications
  • High yield through automatic wedge compensation
  • Open chamber design for fast conversion and maintenance
  • Smallest footprint for a 200 mm bonding system: 0.8 m2
  • Recipes are fully compatible with EVG’s high-volume-manufacturing bonding systems

Applications:

  • MEMS & Sensors        
    For fabricating MEMS devices, sealing cavities, stacking membranes, packaging sensors, etc. Bonding processes like glass frit, eutectic, or direct bonding may be used.
  • 3D Integration & Heterogeneous Integration        
    Bonding different types of wafers or substrates (e.g. silicon to glass, silicon to silicon, integrating sensor/logic layers) in multi-layer stacks.
  • Optoelectronics / Photonics        
    Bonded structures for photonic devices, waveguides, optical elements; bonding active or passive layers onto substrates.
  • Academic / R&D / Pilot Lines        
    Because of its flexibility and ability to transfer recipes to higher-end tools, R&D labs and pilot fabs often use 510 to develop and validate bonding processes.
  • Wafer-Level Packaging / Advanced Packaging        
    Bonding wafers or dies during packaging steps (e.g. sealing, bonding cap wafers, bonding to interposers).
  • Process Development / Bonding Process Exploration        
    Exploring new bonding materials/processes (e.g. TLP, direct, hybrid bonding) in a platform that allows switching and rapid iteration.
  • Small-Volume / Low-Volume Production        
    For niche devices or small-run production, where full-scale automated tools may not be cost-effective, the EVG 510 offers adequate throughput with process reliability.

Book a Live or Virtual Demo

See the capabilities of our partners' equipment - including EVG, scia Systems, Veeco, PPS and SSI - in action. Experience tailored demonstrations designed around your process and application needs.