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A Complex Intercontinental Move and Assembly Project for Multiple Ion Implanters

At IES, we love a challenge. In fact, the more complex the project is, the better.

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Ion Implanter in a Fab

The Subtle Art of Relocating Complex, One-of-a-Kind Equipment Across Borders

Few complex engineering projects compare to the challenge of relocating sensitive, high-technology equipment across borders.

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Trusted Partners for the Microelectronics Industry

At IES, we partner with leading global manufacturers to provide an extensive portfolio of advanced technologies supporting research, development, and production across the semiconductor and compound materials industries.

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Move complex, business-critical equipment

Whether you’re moving a single piece of equipment or an entire production line, our trusted team of engineers can support every step of your move, from rigging to end-to-end relocation support across the globe.

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EVG®770

What is the EVG®770 NT?

The EVG®770 NT is a versatile platform for step-and-repeat (S&R) nanoimprint lithography, used for efficient master fabrication or direct patterning of complex structures on substrates. It enables uniform replication of templates from small dies up to 30 cm², and can replicate those dies multiple times over large areas up to Gen 2 panel-size substrates.

IES is the official UK representative for EV Group (EVG), supplying, installing, and supporting the EVG®770 NT for customers across the UK.

How does the step-and-repeat process work?

Often used in conjunction with diamond turning or direct writing methods, the S&R imprinting process is a key step in efficiently fabricating masters required for wafer-level optics manufacturing or EVG's SmartNIL™ process — taking a single die pattern and replicating it precisely across a much larger substrate area.

What applications does it support?

The EVG®770 NT plays a role in high-volume manufacturing of advanced applications, including augmented reality waveguides, optical sensors, diffractive optics, metasurfaces, and biomedical devices.

What process control does it offer?

Key features of the EVG®770 NT include precise alignment capabilities, full process control, and the flexibility to meet the demanding requirements of a range of structures and materials.

Where can I buy or get support for the EVG®770 NT in the UK?

As EV Group's official UK representative, IES provides UK-based sales, installation, and engineering support for the EVG®770 NT and the wider EVG nanoimprint lithography portfolio.

Features:

  • Efficient master fabrication of microlenses for wafer-level optics down to nanostructures for SmartNIL®
  • Simple implementation of different kind of masters
  • Variable resist dispense modes
  • Live image during dispensing, imprinting and demolding In-situ force control for imprint and demolding
  • Optional optical wedge error compensation
  • Optional automated cassette-to-cassette handling

Applications:

  • Wafer-Level Optics (WLO): Fabrication of microlenses and other optical components for advanced imaging systems.
  • Augmented Reality (AR) Waveguides: Production of waveguides for AR devices, enabling advanced display technologies.
  • Diffractive Optics: Manufacturing of diffractive optical elements for various photonic applications.
  • Metasurfaces: Creation of nanostructured surfaces with tailored optical properties.
  • Biomedical Devices: Development of microfluidic devices and lab-on-a-chip systems for medical diagnostics and research.

Book a Live or Virtual Demo

See the capabilities of our partners' equipment - including EVG, scia Systems, Veeco, PPS and SSI - in action. Experience tailored demonstrations designed around your process and application needs.