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A Complex Intercontinental Move and Assembly Project for Multiple Ion Implanters

At IES, we love a challenge. In fact, the more complex the project is, the better.

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Ion Implanter in a Fab

The Subtle Art of Relocating Complex, One-of-a-Kind Equipment Across Borders

Few complex engineering projects compare to the challenge of relocating sensitive, high-technology equipment across borders.

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Trusted Partners for the Microelectronics Industry

At IES, we partner with leading global manufacturers to provide an extensive portfolio of advanced technologies supporting research, development, and production across the semiconductor and compound materials industries.

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Move complex, business-critical equipment

Whether you’re moving a single piece of equipment or an entire production line, our trusted team of engineers can support every step of your move, from rigging to end-to-end relocation support across the globe.

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scia Coat 500

The scia Coat 500 is designed for the homogeneous coating of large substrates, ideal for precision optics. With recipe-controlled deposition processes, it ensures repeatable quality for multilayer stacks. A customisable shaper system (up to 4 shapers) compensates for material- or parameter-dependent inhomogeneity effects, enabling the deposition of precisely defined gradient films.

Key features:

  • Excellent uniformity due to linear movement
  • Up to 6 water-cooled target materials on a rotational holder for in-situ change
  • Recipe controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM)
  • Controlled movement of linear axis system for gradient coating or surface error correction
  • Optional substrate heating up to 250 °C to optimize film stress

Technical Data:

  • Substrate size - (up to) 500 mm x 300 mm, 300 mm dia. for rotation
  • Substrate holder - Linear movement from 0.1 mm/min up to 900 mm/min, 
    rotation up to 300 rpm
    Ion beam sources Two 380 mm linear microwave ECR sources (LIN380-e)
  • Neutralizer - Filament driven plasma bridge neutralizer (N-DC)
  • Target holder - Target drum with up to 6 tiltable and water-cooled 
    targets (each max. 400 mm x 200 mm)
  • Typical deposition rate - Si: 10 nm/min
  • Uniformity variation - ≤ 0.5 % over 200 mm dia. (σ/mean)
    ≤ 2.0 % over 500 mm x 300 mm (σ/mean)
  • Base pressure - < 5 x 10-8 mbar
  • System dimension:
    (W x D x H)
    3.30 m x 2.40 m x 2.10 m
    (without electrical rack and pumps)
  • Configurations - Single chamber, optional single substrate load lock for 
    substrates up to 200 mm dia.
  • Software interfaces - SECS II / GEM, OPC

Applications 

  • Precision optics & photonics: The Coat 500 is designed for large-substrate and large-area coating, especially optical mirrors and high-precision optics.

  • X-ray / synchrotron optics: Multilayer coatings (e.g., Bragg mirror stacks) for X-ray mirrors, synchrotron beamlines, and other analytical optics. 

  • Large-area optical filters & bandpass mirrors: For large substrates (up to ~500 mm × 300 mm) used in optics, lasers, and maybe display or sensor systems. 

  • High‐value multilayer thin film manufacturing: Where defect-free, dense, smooth films are required — e.g., dielectric/metal stacks for specialized coatings.

Book a Live or Virtual Demo

See the capabilities of our partners' equipment - including EVG, scia Systems, Veeco, PPS and SSI - in action. Experience tailored demonstrations designed around your process and application needs.