- Equipment Partners
- scia Systems
- Metal Deposition
- scia Magna 200
scia Magna 200
The scia Magna 200 is designed for precision wafer coatings through the deposition of metals and/or dielectric layers. Its selectable sputter modes and customisable arrangements allow the system to be tailored to meet specific customer requirements. Suitable for both small-scale R&D applications and mass production, the system can be configured in a cluster layout with software-controlled automatic production for optimised efficiency.
Keay Featues:
- RF bias for conformity and stress control
- Superior uniformity with rotatable substrate holder
- Low substrate temperature with helium cooling contact and electrostatic chuck
- High deposition rates with reactive sputtering in unipolar and bipolar mode
- Variation of film properties by adjustable energetic substrate bombardment
- Co-sputtering with confocal arrangement of magnetrons
Speak with one of our experts
Request a callback from one of our team or book a site survey for your project.