scia Coat 200

The scia Coat 200 delivers exceptional uniformity for coatings on substrates up to 200 mm. Utilizing ion beam sputter deposition, it ensures the creation of smooth, defect-free films, surpassing traditional deposition processes. In-situ optical monitoring guarantees superior process stability. The system also supports the handling of both wafers and arbitrary-shaped substrates, making it versatile for a wide range of applications.

Key features:

• Excellent uniformity by substrate rotation and tilt
• Up to 5 water-cooled target materials on a rotational holder for in-situ change
• Recipe-controlled multilayer deposition with quartz crystal oscillator and/or optical thickness monitor (OTM) and test glass changer
• Direct wafer handling or adaptation to variable substrate sizes with carrier handling
• Equipped with a 350 mm ion beam source as assist source, also usable for ion beam etching processes