Fiji

Our Fiji® series offers a modular, high‑vacuum thermal ALD platform engineered to accommodate diverse deposition requirements. Built on a flexible architecture, it supports multiple precursor and plasma gas configurations to deliver precision and adaptability. The Fiji G2 model represents our next-generation platform, capable of both thermal and plasma-enhanced deposition. Its design benefits from advanced computational fluid dynamics optimisation, fine‑tuning reactor, heater, and trap geometries for consistently reliable performance. An intuitive user interface streamlines recipe monitoring and control, enabling engineers to manage processes with clarity and confidence.

<h3>Technical specifications</h3>

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<td><strong>rational Modes</strong></td>
<td>Continuous Mode™ (Traditional Thermal ALD)<br>Exposure Mode™ (High Aspect Ratio ALD)<br>Plasma Mode™ (Plasma-Enhanced ALD)</td>
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<td><strong>Substrate Size</strong></td>
<td>Up to 200 mm</td>
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<td><strong>Substrate Temperature</strong></td>
<td>500°C 200mm substrate heater standard<br>800°C 100mm substrate heater optional</td>
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<td><strong>Deposition Uniformity</strong></td>
<td>1&nbsp;σ&nbsp;Uniformities<br>Thermal Al₂O₃&nbsp;– 1.5%<br>Plasma Al₂O₃&nbsp;– 1.5%</td>
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<td><strong>Precursors</strong></td>
<td>4 precursor lines standard, up to 6 optional<br>Gas, liquid, or solid precursors individually heatable to 200°C<br>Industry standard high speed ALD valves (10ms minimum pulse time)<br>Widely available 50cc (25mL fill max) stainless steel precursor cylinders</td>
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<td><strong>Gases</strong></td>
<td>100 sccm Ar precursor carrier gas MFC<br>200 sccm Ar plasma gas MFC<br>100 sccm N₂&nbsp;plasma gas MFC<br>100 sccm O₂&nbsp;plasma gas MFC<br>100 sccm H₂&nbsp;plasma gas MFC</td>
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<td><strong>Trap</strong></td>
<td>Integrated, heated, thin foil ALD trap</td>
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<td><strong>Compatibility</strong></td>
<td>Clean Room Class 100 Compatible</td>
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<td><strong>Compliance</strong></td>
<td>CE, TUV, FCC</td>
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<td><strong>Dimensions</strong></td>
<td>F200:<br>1600 x 715 x 1920 mm<br>F200 with load lock:<br>1845 x 715 x 1920 mm</td>
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<td><strong>Power</strong></td>
<td>220-240 VAC, 4200 W per reactor (excludes pump)</td>
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<td><strong>Control</strong></td>
<td>Microsoft Windows™ 7 Laptop PC, LabView based system control</td>
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<td><strong>Vacuum Pump</strong></td>
<td>&gt;50CFM dry pump required<br>Available or customer supplied</td>
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<td><strong>System Options</strong></td>
<td>Spectroscopic Ellipsometer Ports<br>Quartz Crystal Microbalance<br>RGA Port<br>Optical Emission Spectrometer<br>Wafer Plus<br>Ozone Generator<br>Low Vapor Pressure Deposition<br>Glove box Interface<br>Load Lock</td>
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