EVG®7200 LA

The EVG®7200 Large-Area UV Nanoimprint System takes nanoimprint lithography (NIL) to a new level by scaling it to panel-sized substrates (Gen substrates), powered by the latest evolution of SmartNIL™ technology. This system is ideal for applications that require large-area patterning, such as displays, wire grid polarisers, biotechnology, and photonic elements, where size reduction is not possible and maximising substrate utilisation is critical. NIL has proven to be the most cost-effective method for fabricating nanopatterns on large areas, as it is not constrained by optical limitations and delivers superior pattern fidelity for the smallest structures. SmartNIL™ technology ensures outstanding conformal imprinting results, achieving structures down to 40 nm* with a highly controllable and robust tooling process. With its unmatched ease of use, proven equipment capabilities, and strong process expertise, the EVG®7200 pushes nanoimprinting technology to new heights, addressing the evolving needs of the industry. (*Resolution dependent on process and template.

Features

• Proprietary SmartNIL® technology provides unmatched conformal imprinting over large areas
• Proven technology with superior replication fidelity and uniformity
• Multiple-use polymer working stamp technology for longest master lifetime and significant cost savings
• Robust and precisely controllable processing
• Compatible with all commercially available imprint materials