- Equipment Partners
- EV Group
- Lithography
- EVG®150
EVG®150
The EVG®150 is a fully modular, automated resist processing tool designed for high-throughput spin, spray, and develop processes. Its ultra-compact footprint of less than 3 m², combined with a redesigned modular structure, ensures easy access to individual chambers and robot areas for streamlined operation and maintenance. The system features four wet processing modules and up to 20 bake/chill units, providing outstanding throughput for real-life processes. A high-speed, high-accuracy robot, along with advanced scheduler algorithms, enables maximum throughput while maintaining exceptional process quality. Despite its compact design, the EVG®150 can accommodate up to 12 pumps and resist bottles within the main frame, ensuring a highly flexible and scalable solution. The system guarantees uniform coatings across a wide range of applications—from thick resists to sub-micron layers—and is ideal for wafers with high topography, thanks to EVG’s proprietary OmniSpray™ ultrasonic atomisation technology. With up to four XY spray coat modules, the EVG®150 delivers unrivalled spray coating throughput, making it the perfect choice for applications in MEMS, image sensors, advanced packaging, RF, 5G, 3D sensing, photonics, automotive, and power electronics manufacturing.
Features
- Wafer sizes up to 300 mm Up to six process modules
- Customizable number - up to twenty bake/chill/vapor prime stacks
- Up to four FOUP load ports or cassette loading
- Available modules include Spin Coat, Spray Coat, NanoCoat™, Develop, Bake/Chill/Vapor/Prime
- EV Group’s proprietary OmniSpray® ultrasonic atomization technology provides unmatched process results when it comes to conformal coating of extreme topographies
- Optional NanoSpray™ module achieves conformal coating of 300-micron deep patterns with aspect ratios up to 1:10 and vertical sidewalls
- Extensive range of supported materials
- Bake modules for up to 250 °C
- Megasonic technology for cleaning, sono-chemical processing and developing improves process efficiency and lowers the process time from hours to minutes
- Sophisticated and field-proven robot handling with dual end-effector capability ensures continuous high throughput
- Handling of thick or ultra-thin, fragile, bowed or small-diameter wafers
- Versatile combinations of multi-functional modules for spin and spray coating, developing, bake and chill provide great opportunities in many fields of application EFEM (Equipment Frontend Module) and optional FSS (FOUP Storage System)
- Process technology excellence and development service
- Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
- Smart process control and data analysis feature [Framework SW Platform]
- Integrated analysis features for process and machine control
- Equipment and process performance tracking feature
- Parallel/queueing task processing feature
- Smart handling features
- Occurrence and alarm analysis
- Smart maintenance management and tracking
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