- Equipment Partners
- EV Group
- Lithography
- EVG®120
EVG®120
The EVG®120 is a fully automated, versatile resist processing tool designed to handle multiple substrate shapes and sizes up to 200 mm (8"). Its ultra-compact design, coupled with a dedicated chemistry cabinet for efficient chemical storage, enhances throughput and supports high-volume production environments. Optimised for the most demanding customer requirements, the EVG®120 delivers exceptional quality across a wide range of applications. With its focus on minimising total cost of ownership, this system ensures a cost-effective solution without compromising on performance or reliability.
- Wafer sizes up to 200 mm
- Ultra-compact design for minimal footprint
- Up to 2 coat/develop chambers and 10 hot/chill plates
- Versatile combinations of multi-functional modules for spin and spray coating, developing, bake and chill provide great opportunities in many fields of application
- Chemistry cabinet for external storage of chemicals
- EV Group’s proprietary OmniSpray® ultrasonic atomization technology provides unmatched process results when it comes to conformal coating of extreme topographies
- CoverSpinTM rotating cover for low resist consumption and optimized resist coating uniformity
- Megasonic technology for cleaning, sono-chemical processing and developing improves process efficiency and lowers the process time from hours to minutes
- Sophisticated and field-proven robot handling with dual end-effector capability ensures continuous high throughput
- Process technology excellence and development service
- Multi-user concept (unlimited number of user accounts and recipes, assignable access rights, different user interface languages)
- Smart process control and data analysis feature [Framework SW Platform] Integrated analysis features for process and machine control
- Equipment and process performance tracking feature
- Parallel/queueing task processing feature
- Smart handling features
- Occurrence and alarm analysis
- Smart maintenance management and tracking
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