scia Multi 680

The scia Multi 680 is engineered for periodic multilayer coatings on curved substrates. Offering superior process performance across multiple 100-layer periods, it enables the deposition of high-precision, homogeneous, or gradient films. With automatic sample loading and a separate load lock, the system ensures extremely short loading times and delivers high throughput for efficient production.

Key features:

• Homogeneous or gradient films on curved substrates by synchronized orbital and spin rotation
• Up to 7 magnetrons, each with separate housing for individual gas supply and defined particle emission profile
• Optional pretreatment with additional ion beam source
• Carrier based handling system with load lock and two independent substrate positions
• Substrate face-down orientation for minimized particle load

Technical Data:

• Substrate size - (up to) 680 mm dia., 130 kg
  Sputter source Up to 7 rectangular magnetrons (600 mm x 90 mm),
  ion beam source possible
  Sputter modes DC in cw or pulsed mode (1 kW) and/or
  RF (1 kW, 13.56 MHz)
• Typical deposition rates - Cr: 45 nm/min, Si: 22 nm/min, Ti: 22 nm/min
• Uniformity variation - < 0.1 % (σ/mean) over 300 mm dia.,
  < 0.2 % (σ/mean) over 450 mm dia.
• Base pressure - < 1 x 10-8 mbar
• System dimension:
  (W x D x H)
  7.90 m x 4.40 m x 3.50 m
  (without electrical rack and pumps)
• Configuration - Single chamber with double substrate load lock
• Software interface - OPC

Applications:

• Precision optics / large-area optical substrates: The Multi 680 supports very large substrates (up to ~680 mm diameter) which are commonly used in optics, mirrors, beam-line components, synchrotron or X-ray optics. 
  
  
• Multilayer thin-film coatings: Especially for applications requiring periodic multilayers (e.g., X-ray mirrors, Bragg reflectors, anti-reflective stacks) on large substrates. 
  
  
• High-end manufacturing for niche/large substrates: Because of the ability to handle large and potentially heavy substrates, this tool is suited for production of large optical components rather than just small wafers.