scia Coat 200

Used for the homogeneous coating of 200 mm substrates like wafers, the scia Coat 200 can be utilised in applications such as multilayer films for optical coatings or magnetic sensors. The system applies a beam onto a sputter target from a focused broad beam ion source. It is possible to pre-clean the substrate or control film characteristics via ion bombardment.

Ion beam milling processes are available on the same tool, when the system uses an RF350-e ion beam source as assist source.